Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available.
Plasma Systems for the deposition of thin films from the gas phase.
Plasma Systems for the deposition of thin films by means of sputtering processes.
Atmospheric Pressure Plasma Sources
Unique Integration of electrical supply and plasma generation.
Multi chamber plasma systems with substrate handling (PVD, RIE, PECVD).
DIN EN 9001
Aurion is certified for DIN EN 9001:2008.
Atmospheric pressure plasma sources, RIE, microwave downstream plasma, PVD (Sputtering) and PECVD systems as well as combinations thereof, including cluster tools.
Radio frequency components like Automatic Impedance Matching Networks (Matchboxes), Switches, Filters, Power Splitters, Phase Shifters etc.
Aurion´s team offers its extensive expertise in the areas of plasma technology and radio frequency technology for consulting services and training classes.
Aurion Anlagentechnik GmbH
Am Sandborn 14
Tel. +49(0) 6182 96 28 -0
Fax. +49(0) 6182 96 28 -16